Patent · US Expired

High-frequency electron source

US6870321B2 · kind B2 · utility

3Cited by

9References

30Claims

0Family size

Assignee

ASTRIUM GMBH · DE

Inventors

Karl-Heinz Schartner · Gießen, DE
Horst Loeb · Gießen, DE
Hans Leiter · Oedheim, DE
Hans-Peter Harmann · Gettorf, DE

Key dates

Filing date	Apr 9, 2003
Grant date	Mar 22, 2005
Priority date	—
Expiry date	Jun 8, 2023

Classification

Technology area (CPC H)Electricity
CPC primaryH01J3/025
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A high-frequency electron source includes a discharge chamber having at least one gas inlet for a gas to be ionized and at least one extraction opening for electrons. The high-frequency electron source also includes a first electrode at least partially surrounding the discharge chamber and a keeper electrode at least partially surround the discharge chamber. The first electrode and the keeper electrode are configured to provide a high-frequency electric field therebetween.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.