Method for detecting defects in a material and a system for accomplishing the same
US6870950B2 · kind B2 · utility
3Cited by
5References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 15, 2001 |
| Grant date | Mar 22, 2005 |
| Priority date | — |
| Expiry date | Dec 12, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/95
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention provides a method for detecting defects in a material and a system for accomplishing the same. The method includes obtaining an image of at least a portion of a material's surface and converting the image into an intensity profile. The method further includes determining a defect in the material's surface from the intensity profile. In one exemplary embodiment, the image is an electron image obtained using a scanning electron microscope. The method may further be used to determine a defect density in the material's surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.