Method and apparatus for monitoring the operation of a wafer handling robot
US6871115B2 · kind B2 · utility
102Cited by
11References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 11, 2002 |
| Grant date | Mar 22, 2005 |
| Priority date | — |
| Expiry date | Apr 14, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B2219/42332
- WIPO fieldHandling
- WIPO sectorMechanical engineering
Abstract
The integrity of control signals used to control a wafer handling robot is monitored by a monitor connected to various points of the robotic control system. The monitor includes a memory for storing data sets representing correct, reference characteristics of the control signals. The monitor samples control signals at various points in the control system and compares these sampled signals with the stored reference characteristics in order to determine whether a signal disparity exists. If a disparity exists, the monitor generates an error.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.