Target and method of optimizing target profile
US6872284B2 · kind B2 · utility
24Cited by
6References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 20, 2002 |
| Grant date | Mar 29, 2005 |
| Priority date | — |
| Expiry date | Feb 20, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/35
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of constructing increased life sputter targets and targets made by the method are disclosed. The method comprises starting with a precursor target design or profile and making magnetic field strength measurements along the radial surface of same and at a plurality of vertical dimensions above the surface. An optimal magnetic field strength ratio is provided between the erosion tracks of the target. The vertical dimension of the material to be added to one of the erosion tracks is determined and then the height of the other erosion track is calculated by utilizing this optimal magnetic field strength ratio.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.