Apparatus and method for large area chemical vapor deposition using multiple expanding thermal plasma generators
US6872428B2 · kind B2 · utility
114Cited by
6References
14Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 19, 2002 |
| Grant date | Mar 29, 2005 |
| Priority date | — |
| Expiry date | Mar 25, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/44
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Chemical vapor deposition is performed using a plurality of expanding thermal plasma generating means to produce a coating on a substrate, such as a thermoplastic and especially a polycarbonate substrate. The substrate is preferably moved past the generating means. Included are methods which coat both sides of the substrate or which employ multiple sets of generating means, either in a single deposition chamber or in a plurality of chambers for deposition of successive coatings. The substrate surfaces spaced from the axes of the generating means are preferably heated to promote coating uniformity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.