Method for forming micropatterns
US6872511B2 · kind B2 · utility
2Cited by
2References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 15, 2002 |
| Grant date | Mar 29, 2005 |
| Priority date | — |
| Expiry date | Jan 3, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method for forming micropatterns includes forming a thin film consisting of a single layer or of plural layers on a substrate, irradiating an energy beam to the thin film to elevate the temperature of a region to a predetermined temperature or higher to thereby modify the region of the thin film, and patterning the thin film at least in such a manner to leave over the modified region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.