Patent · US Expired

Method and system for providing optical alignment for a visible wavelength reflective system

US6873467B1 · kind B1 · utility

0Cited by
5References
29Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 24, 2001
Grant dateMar 29, 2005
Priority date
Expiry dateJan 1, 2023

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B27/62
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method for providing optical alignment for a visible wavelength reflective system is provided. The method includes positioning a first mirror blank on a lathe fixture. The first mirror blank comprises a single precision pinhole. The first mirror blank is secured to the lathe fixture. A first mirror is generated from the first mirror blank.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.