Apparatus and method for irradiating a substrate
US6874899B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 12, 2002 |
| Grant date | Apr 5, 2005 |
| Priority date | — |
| Expiry date | Feb 6, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133788
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system for processing a multilayer liquid crystal film display material, with multiple irradiation apparatus (60) for applying a zone of polarized UV irradiation onto a substrate fed from a web (16) with incident light at a desired angle. Each irradiation apparatus (60) includes a UV light source (64), and one or more optional filters (82). A polarizer (90) is provided, sized and arranged to polarize light over the web (16) as it moves. The irradiation apparatus (60) employs an array of louvers (81) and/or a prism array (72). One irradiation apparatus (60) irradiates a first LPP1 layer (22) at a 0-degree alignment, in the web movement direction, the other irradiation apparatus (60) irradiates an LPP2 layer (26) with an orthogonal 90-degree alignment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.