Process for production of partially protected poly(hydroxystyrene)s
US6875821B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 25, 2002 |
| Grant date | Apr 5, 2005 |
| Priority date | — |
| Expiry date | Jan 25, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F2800/20
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A process for making poly(hydroxystyrene)s whose phenolic hydroxyl groups are partially protected by acid-decomposable or -eliminable groups, by which the degree of deblocking of the phenolic hydroxyl groups is controlled. Namely, the production of a polymer containing, in the molecule, repeating units of the general formula (IA) and those of the general formula (IB), comprising adding an acid to polymer (B) containing in the molecule repeating units of general formula (II) in an organic solvent with the molar ratio of the acid to the OR3 group being 0.0001 equivalent or above but below 0.05 equivalent, and reacting the polymer with the acid. In the general formulae, R1 is hydrogen or methyl; R2 is C1-6 alkyl; R3 is an acid-decomposable or -eliminable group; R4 is hydrogen or a group derived from R3 by decomposition with acid; and p is 0, 1, or 2, with the proviso that the IB/IA molar ratio ranges 98/2 to 30/70.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.