Photosensitive material and laser marking method
US6876377B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 5, 2002 |
| Grant date | Apr 5, 2005 |
| Priority date | — |
| Expiry date | Jan 18, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B27/52
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive material in which a fog unnecessary for a photosensitive material is not generated when irradiation of a laser beam and a character or a mark is printed by an array of optically distinguishable dot patterns is provided. When the dot patterns are arrayed by M number in column and N number in row and the character or the mark having a size of A×B is printed, the dot pattern has irregularity of no more than S+10 μm, and an almost circular shape of no lower than 100 μm and not more than the smaller diameter either A/M or B/N, when viewed from the emulsion layer side. A surface roughness is set in the range of 0.2 μm to 1.0 μm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.