High frequency infrared radiation source
US6878938B2 · kind B2 · utility
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41References
34Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 16, 2003 |
| Grant date | Apr 12, 2005 |
| Priority date | — |
| Expiry date | Jul 16, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J3/108
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A high frequency infrared radiation source including a hermetically sealed chamber with a plasma generating gas therein, a pair of spaced electrodes in the chamber for creating a plasma therebetween, a window in the chamber, and a collimating lens made of infrared radiation transmissive material disposed between the pair of electrodes and the window.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.