Patent · US Expired

Structure of slot feature for shadow mask

US6879092B2 · kind B2 · utility

0Cited by
4References
10Claims
0Family size

Assignee

Inventor

Key dates

Filing dateSep 12, 2002
Grant dateApr 12, 2005
Priority date
Expiry dateSep 12, 2022

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2229/0755
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A structure of a slot feature for a shadow mask in which, on the assumption that the width at the point of ½ in a vertical direction in the feature of slots of the shadow mask is ‘Sw’, horizontal distances from a virtual vertical line passing an apex of a concave portion of a slot at a marginal portion to a protrusion portion formed at both upper and lower sides on the basis of the width Sw line are ‘M’ and ‘N’, and angles inclined in the direction of the protrusion portion from the virtual straight line passing the apex of the curved protrusion portion formed at the opposite side of the concave portion are ‘P’ and ‘Q’, there are at least one and more mask slot satisfying a formula of M>0, N>0, P>0°, Q>0°. The shape of electron beams by positions on the screen are identical to each other, and the shape of electron beam at the left and right sides of marginal portion can be maintained in a straight line in the vertical direction. Accordingly, a purity margin of the electron beam can be increased and brightness characteristics can be improved, and thus, a quality of color reproduction can be heightened.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.