Exposure apparatus and method of conveying mask and work
US6879378B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 14, 2003 |
| Grant date | Apr 12, 2005 |
| Priority date | — |
| Expiry date | Jul 14, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70741
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus includes a first transferring passage and a second transferring passage arranged at two different levels between a load/unload position and an exposure position, a first table and a second table one positioned in the load/unload position while the other positioned in the exposure position, a hoist mechanism which elevates one of the first and second tables to the first transferring passages, and lowers the other of the second and first tables to the second transferring passage, and a conveyor mechanism which transfers the first and second tables respectively to the load/unload position and the exposure position. Each of the first and second tables has a stage plate on which a work is placed, and a light-transmissible plate to which a mask is previously mounted.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.