Method and apparatus for performing pattern defect repair using Q-switched mode-locked pulse laser
US6879605B2 · kind B2 · utility
25Cited by
15References
74Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 24, 2001 |
| Grant date | Apr 12, 2005 |
| Priority date | — |
| Expiry date | Feb 24, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A method for repairing a pattern by using a laser and a laser-based pattern repair apparatus are provided which are capable of reducing splashes, rolling-up, and damage to a glass substrate to a minimum in pattern defects repairing processing by removing a thin metal layer such as a chromium layer. A part of a string of pulses obtained by slicing, using an optical shutter, pulses from laser light having a pulse width of 10 ps to 300 ps emitted from a Q-switched mode-locked pulse laser is used to produce multi-pulses which are divided into two portions in terms of time base correction using an optical delaying unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.