Deposition monitoring system
US6880402B1 · kind B1 · utility
64Cited by
36References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 26, 2000 |
| Grant date | Apr 19, 2005 |
| Priority date | — |
| Expiry date | Oct 26, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2291/0422
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Described is an apparatus for detecting and removing deposits from a surface exposed to wellbore fluids. The apparatus can monitor the rate of deposition and subsequently remove the deposited material. The combination of detection apparatus and removal apparatus provides an instrument with self-cleaning operation mode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.