Electrode arrangement

US6881270B1 · kind B1 · utility

Assignee

• Applied Films GmbH & Co. · DE

Inventors

• Thomas Gebele · Neuses, DE
• Jurgen Henrich · Limeshain, DE
• Stefan Bangert · Lauentheil, DE
• Jürgen Honekamp · Hanau, DE
• Elisabeth Budke · Hürth, DE
• Jürgen Ulrich · Blankenloch, DE
• Helmut Grimm · Mountainside, US

Key dates

• Filing date: Nov 9, 2000
• Grant date: Apr 19, 2005
• Expiry date: Oct 10, 2021

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J37/32532
• WIPO field: Electrical machinery, apparatus, energy
• WIPO sector: Electrical engineering

Abstract

An electrode arrangement for the plasma-aided coating of a substrate (3) with a layer of material comprising at least one first and a second material component and for the production of a plasma discharge, more especially an arc discharge (35), having an anode arrangement (5), which provides the first material component at an anode material surface (13) for evaporation, and a cathode arrangement (7), which provides the second material component at a cathode material surface (25). The electrode arrangement is characterized in that the cathode material surface (25) is constituted by an evaporation-active part (27) supporting the plasma discharge (35) and an evaporation-inactive part (41) not supporting the plasma discharge. Preferably, a motion-producing means (49) is provided for moving the evaporation-inactive part (41) over the cathode material surface (25) in order to reduce deposit of material due to he first material component on the cathode material surface (25).