Method for manufacturing spacer for electron source apparatus, spacer, and electron source apparatus using spacer
US6884138B1 · kind B1 · utility
12Cited by
13References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 23, 2000 |
| Grant date | Apr 26, 2005 |
| Priority date | — |
| Expiry date | Feb 23, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2329/8645
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for manufacturing a spacer for use in an electron source apparatus comprising an electron source having an electron emission device, an opposing member opposed to the electron source and a spacer provided between the electron ray source and the opposing member, the method comprising a coating step for providing a film on a spacer substrate constituting the spacer, the coating step including a step for bringing a preformed film type material into contact with the spacer substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.