Antireflection film
US6884495B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 19, 2001 |
| Grant date | Apr 26, 2005 |
| Priority date | — |
| Expiry date | Apr 25, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/25
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An antireflection film is formed of an organic film, a hard hard coating layer on the organic film, a first layer coated on the hard coating layer, and a second layer having an index of refraction lower than that of the first layer and coated on the first layer. The first layer is formed of a synthetic resin having pores therein and metallic oxide particles contained in the synthetic resin. The metallic oxide is at least on selected from the group consisting of ZrO1, TiO2, NbO, ITO, ATO, SbO2, In2O3, SnO2 and ZnO. The synthetic resin is ultraviolet ray curable resin or electron beam curable resin. The second layer partly enters the pores of the first layer to firmly bond to the first layer through the pores.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.