Method of manufacturing TFT array
US6884569B2 · kind B2 · utility
7Cited by
3References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 3, 2002 |
| Grant date | Apr 26, 2005 |
| Priority date | — |
| Expiry date | Jan 27, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/50
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In the halftone region of a photomask, uniformity in thickness of the photoresist is enhanced. The halftone region of the photomask is arranged such that a transmitting portion and a shielding portion are alternately provided to form a transmitting/shielding pattern. The transmitting portion at the end of the transmitting/shielding pattern has a larger area than the other transmitting portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.