Method and apparatus for determining layer thickness and composition using ellipsometric evaluation
US6884640B2 · kind B2 · utility
5Cited by
8References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 13, 2003 |
| Grant date | Apr 26, 2005 |
| Priority date | — |
| Expiry date | May 13, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/211
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
One embodiment of the present invention provides a system that determines the composition of a layer within an integrated device. The system operates by first receiving the integrated device. Next, the system measures properties of the layer using electromagnetic radiation. The properties of the layer measured are used to determine an index of refraction for the layer. The system then solves for the composition of the layer using the index of refraction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.