Patent · US Expired

Methods for creating optical structures in dielectrics using controlled energy deposition

US6884960B2 · kind B2 · utility

6Cited by
2References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 21, 2001
Grant dateApr 26, 2005
Priority date
Expiry dateOct 10, 2021

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B2006/12171
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

The present invention relates to a method for writing an optical structure within a workpiece of a dielectric material using FLDM. In a first embodiment system parameters for the FLDM are determined in dependence upon the dielectric material, a predetermined volume element and a predetermined change of the refractive index of the dielectric material within the predetermined volume element. The system parameters are determined such that self-focusing of a pulsed femtosecond laser beam is inhibted by non-linear absorption of the energy of the pulsed femtosecond laser beam within the dielectric material. A pulsed femtosecond laser beam based on the determined system parameters is focused at a predetermined location within the workpiece for inducing a change of the refractive index through dielectric modification within the predetermined volume element, the volume element including the focus. Various embodiments enable writing of various different optical structures into a workpiece.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.