Plasma cleaning gas with lower global warming potential than SF6
US6886573B2 · kind B2 · utility
4Cited by
28References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 6, 2002 |
| Grant date | May 3, 2005 |
| Priority date | — |
| Expiry date | Oct 9, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/905
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for cleaning a deposit from an interior surface of a processing chamber includes generating a plasma from a cleaning gas including SO2F2 and contacting the interior surface with the plasma for a time sufficient to convert the deposit into a volatile product, thereby cleaning the deposit from the interior surface, in which the process is conducted in the absence of SF6. The deposits, which may be removed by the process of the invention, include silicone, silicone oxide, silicone nitride, tungsten, copper and aluminum.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.