Projector brightness enhancement using rectilinear apertures
US6886944B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 13, 2003 |
| Grant date | May 3, 2005 |
| Priority date | — |
| Expiry date | May 24, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N5/7458
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A projector includes an array of micromirror light modulators and a projector light source for generating an illumination light beam along an optical path. An elongated rectilinear illumination aperture is defined at a first location along the optical path, with one or more elongated regions having a long dimension parallel to the axis. An elongated rectilinear pupil aperture is defined at an output pupil with one or more elongate pupil regions having a long dimension parallel to the axis.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.