Patterning solution deposited thin films with self-assembled monolayers
US6887332B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 21, 2000 |
| Grant date | May 3, 2005 |
| Priority date | — |
| Expiry date | Apr 21, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S428/914
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a method of forming a patterned thin film on a surface of a substrate having thereon a patterned underlayer of a self-assembled monolayer. The method comprises depositing a thin film material on the self-assembled monolayer to produce a patterned thin film on the surface of the substrate. The present invention further provides processes for preparing the self-assembled monolayer. The present invention still further provides solution-based deposition processes, such as spin-coating and immersion-coating, to deposit a thin film material on the self-assembled monolayer to produce a patterned thin film on the surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.