Micromirror unit and method of making the same
US6887396B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Sep 13, 2001 |
| Grant date | May 3, 2005 |
| Priority date | — |
| Expiry date | Apr 29, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S359/904
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.