Fluorocarbon-organosilicon copolymers and coatings prepared by hot-filament chemical vapor deposition
US6887578B2 · kind B2 · utility
67Cited by
29References
53Claims
0Family size
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Key dates
| Filing date | Oct 29, 2002 |
| Grant date | May 3, 2005 |
| Priority date | — |
| Expiry date | Oct 29, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31906
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Hot-filament chemical vapor deposition has been used to deposit copolymer thin films consisting of fluorocarbon and siloxane groups. The presence of covalent bonds between the fluorocarbon and organosilicon moieties in the thin film has been confirmed by Infrared, X-ray Photoelectron (XPS) and solid-state 29Si, 19F, and 13C Nuclear Magnetic Resonance (NMR) spectroscopy. The film structure consists of chains with linear and cyclic siloxane groups and CF2 groups as repeat units.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.