Method and device for correcting pattern film on a semiconductor substrate
US6890387B2 · kind B2 · utility
2Cited by
2References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 19, 2001 |
| Grant date | May 10, 2005 |
| Priority date | — |
| Expiry date | Jun 10, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/72
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In order to correct a white defect on a surface of a substrate, the substrate is held with the surface facing downward, laser light is upward irradiated at the defect on the surface in material gas, and as a result, the white defect is covered with film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.