Plasma-assisted processing of gaseous media
US6890495B1 · kind B1 · utility
1Cited by
4References
19Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 28, 2000 |
| Grant date | May 10, 2005 |
| Priority date | — |
| Expiry date | Feb 28, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02T10/12
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A reactor for the plasma-assisted processing of a gaseous medium, including a pair of electrodes having facing surfaces the separation of which is substantially uniform, with a body of dielectric material positioned between them and defining a plurality of gas passages extending through the space between the electrodes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.