Apparatus and method for retention of non-thermal plasma reactor
US6893617B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 14, 2001 |
| Grant date | May 17, 2005 |
| Priority date | — |
| Expiry date | Jun 24, 2023 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF01N2570/14
- WIPO fieldEnvironmental technology
- WIPO sectorChemistry
Abstract
A non-thermal plasma reactor is provided. The reactor includes a plasma-generating substrate, a housing, a voltage supplied to the plasma-generating substrate, and a retention material. The plasma-generating substrate has one or more flow paths for an exhaust gas. The plasma-generating substrate includes at least one weak area and at least one strong area. The housing has an inlet opening and an outlet opening. The voltage is supplied to the plasma-generating substrate for generating a plasma field. The retention material retains the plasma-generating substrate in the housing such that the one or more flow paths are in fluid communication with the inlet opening and the outlet opening. The retention material is configured to provide a higher retention force to the at least one strong area and a lower retention force to the at least one weak area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.