Method for constructing a photomask assembly using an encoded mark
US6894766B1 · kind B1 · utility
10Cited by
5References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 26, 2002 |
| Grant date | May 17, 2005 |
| Priority date | — |
| Expiry date | Jun 5, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/38
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for constructing a photomask assembly using an encoded mark is disclosed. The method includes comparing a first encoded mark located on a photomask with a second encoded mark located on a pellicle. The first encoded mark includes one or more first symbols and the second encoded mark includes one or more second symbols. The method further includes mounting the pellicle on the photomask if at least one of the symbols of the first encoded mark matches at least one of the symbols of the second encoded mark.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.