Multiple focal spot X-ray inspection system
US6895079B2 · kind B2 · utility
11Cited by
18References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 20, 2002 |
| Grant date | May 17, 2005 |
| Priority date | — |
| Expiry date | Oct 7, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2223/419
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An X-ray inspection system includes an X-ray source that generates more than one beam defining an inspection plane, the beams being substantially parallel to each other; an X-ray detector having a plurality of detector arrays, each of which is aligned with one of the beams, and structure for supporting an object between the X-ray source and the X-ray detector. The X-ray source includes an electron gun and a device for steering an electron beam generated by the gun to multiple focal spots on a target.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.