Metallized film, method for the production thereof, and use thereof
US6896938B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 3, 2003 |
| Grant date | May 24, 2005 |
| Priority date | — |
| Expiry date | Apr 3, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31678
- WIPO fieldOther consumer goods
- WIPO sectorOther fields
Abstract
A partially vapor-deposited metallized film is disclosed including a metallized film that is vapor-deposited across the entire surface, and a metallized film that has been coated a number of times and also a method for producing a partially vapor-deposited metallized film, a metallized film that is vapor-deposited across the entire surface, and a metallized film that has been coated a number of times, wherein either a structure is printed onto a substrate or onto a supporting film with a soluble ink (washable ink) or the base materials are directly cleaned in a vacuum by means of plasma processing and are simultaneously initiated with target atoms, and wherein a metal or the like is vapor-deposited thereon followed by a production of the structured layer, for multiple uses, for example, in securities, as a radio frequency antenna for transponders and the like.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.