Aperture masks for circuit fabrication
US6897164B2 · kind B2 · utility
92Cited by
28References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 14, 2002 |
| Grant date | May 24, 2005 |
| Priority date | — |
| Expiry date | Feb 14, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/943
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Aperture masks and deposition techniques for using aperture masks are described. In addition, techniques for creating aperture masks and other techniques for using the aperture masks are described. The various techniques can be particularly useful in creating circuit elements for electronic displays and low-cost integrated circuits such as radio frequency identification (RFID) circuits. In addition, the techniques can be advantageous in the fabrication of integrated circuits incorporating organic semiconductors, which typically are not compatible with wet processes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.