Device for treating particulate material
US6898869B2 · kind B2 · utility
Inventor
Key dates
| Filing date | Dec 11, 2003 |
| Grant date | May 31, 2005 |
| Priority date | — |
| Expiry date | Dec 11, 2023 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2208/00761
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A device for treating particulate material has a process chamber. A bottom of the process chamber is composed of baffle plates which overlap one another and between which slots are formed. It is proposed to design the baffle plates as annular plates, so that circular slots are formed, and to place the annular plates in such a way that a radially outer, first flow, directed from outside to inside, of process air passing through, and a radially inner, second flow, directed from inside to outside, of process air passing through are formed, the two opposed flows meeting one another along a circular breaking-up zone and being deflected into a flow directed vertically upwards.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.