Article holders that use gas vortices to hold an article in a desired position
US6899788B2 · kind B2 · utility
2Cited by
1References
3Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 13, 2003 |
| Grant date | May 31, 2005 |
| Priority date | — |
| Expiry date | Oct 19, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2001
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An article (e.g. a semiconductor wafer) is held in an article holder by means of a number of gas flows emitted from gas vortex chambers. Some of the gas flows act to cool an adjacent article portion more than the other gas flows. For example, some of the vortex chambers emit more gas per unit of time than the other chambers. More cooling is provided to those portions of the article which are heated more during processing. Greater temperature uniformity can be achieved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.