Patent · US Expired

Probing device and manufacturing method thereof, as well as testing apparatus and manufacturing method of semiconductor with use thereof

US6900646B2 · kind B2 · utility

98Cited by
26References
34Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 10, 2002
Grant dateMay 31, 2005
Priority date
Expiry dateAug 28, 2022

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01R3/00
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A probing device for electrically contacting with a plurality of electrodes 3, 6 aligned on an object 1 to be tested so as to transfer electrical signal therewith, comprising: a wiring sheet being formed by aligning a plurality of contact electrodes 21, 110b, corresponding to each of said electrodes, each being planted with projecting probes 20, 110a covered with hard metal films on basis of a conductor thin film 41 formed on one surface of an insulator sheet 22 of a polyimide film by etching thereof, while extension wiring 23, 110c for electrically connecting to said each of said contact electrodes being formed on basis of a conductor thin film formed on either said one surface or the other surface opposing thereto of said insulator sheet of the polyimide film; and means for giving contacting pressure for obtaining electrical conduction between said extension wiring and said object to be tested by contacting tips of said projecting contact probe formed onto said each contact electrode through giving pressuring force between said wiring sheet and said object to be tested.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.