Method for manufacturing polymer microstructures and polymer waveguides
US6902871B2 · kind B2 · utility
6Cited by
33References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 3, 2002 |
| Grant date | Jun 7, 2005 |
| Priority date | — |
| Expiry date | Jan 3, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/065
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A microfabrication process for preparing articles in which a precursor article that includes (a) a substrate, (b) a first polymer layer overlying the substrate, (c) a second polymer layer overlying the first polymer layer, (d) a metal hardmask layer overlying the second polymer layer, and (e) a photodefinable layer overlying the metal hardmask layer is subjected to photolithographic imaging, developing, and plasma etching steps to form an article that includes the substrate and portions of the first polymer layer arranged in a pattern corresponding to the pattern of the photomask used for photolithographic imaging.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.