Device for removing residues from surfaces and a method for accomplishing the same
US6905553B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 22, 2004 |
| Grant date | Jun 14, 2005 |
| Priority date | — |
| Expiry date | Mar 22, 2024 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA47L13/00
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present invention involves a solvent vapor transfer device for holding an absorbent pad, which receives and disperses solvent vapors over a lacquer-based residue on a textile. A solvent is poured or dripped into an absorbent pad portion of the vapor transfer box, from which solvent vapors are released. The solvent vapors pass through the vapor transfer box and concentrate in a vapor chamber over the lacquer-based residue and textile. As the solvent vapors come into continuous contact with the lacquer-based residue, the residue begins to dissolve and soften. Upon sufficient dissolution, minute quantities of the liquid solvent may be applied directly to the partially dissolved residue and quickly suctioned into an extraction vacuum. This process may be repeated as necessary to achieve complete removal of the residue.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.