Photo-patternable mono-phase fluorinated organometallic sol-gels for integrated optics and methods of fabrication
US6908723B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 15, 2002 |
| Grant date | Jun 21, 2005 |
| Priority date | — |
| Expiry date | Jul 22, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/12097
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photo-patternable perfluorinated silane sol-gel material is presented that exhibits a high refractive index and propagation losses below 1 dB/cm at the telecommunication wavelengths. The sol-gels are produced with general formula [(CH2)n,R′—Si(O)2]x—[Si(O)4]y—[R′—Si(O)3]z—[R″(CH2)n—M(O)3]w—[R′″(CH2)n—Si(O)3]v where O is oxygen, Si is silicon, M is a metal alkoxyde known to form bonds with organic compounds through oxygen donor ligands, and where , R″ and R′″ are photo cross-linkable groups, and where (CH2)n are alkyl spacers with n being an integer ≧0. The sol-gels can be fabricated to produce complex waveguide structures directly onto silica-on-silicon substrates with low bending losses.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.