Patent · US Expired

Method and apparatus for measuring ripple and distortion in a transparent material

US6909502B2 · kind B2 · utility

6Cited by
16References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 7, 2002
Grant dateJun 21, 2005
Priority date
Expiry dateAug 4, 2023

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N21/958
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

An apparatus and method for quantitatively measuring ripple and distortion levels in a transparent sheet (or film) material is provided. The apparatus includes a light source for projecting light beams onto a screen. A frame assembly is positioned intermediate to the light source and is adapted to hold the transparent sheet material at a predetermined angle and distance from the screen. The light beams pass though the transparent sheet material and projects an image onto the screen. The process includes digitally capturing the image and generating parameter signals from the digital image. The parameter signals are used in a model to quantitatively assign a value to the level of ripple and distortion present in the transparent sheet material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.