Photosensitive material processing apparatus
US6910815B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 24, 2002 |
| Grant date | Jun 28, 2005 |
| Priority date | — |
| Expiry date | Sep 24, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03D3/132
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a photosensitive material processing apparatus in which a photosensitive material is processed with a processing solution. Reliable liquid displacement in the vicinity of the surface of a photosensitive material, and uniform temperature adjustment can be performed. Also, damage or a transport deficiency, caused by a corner of the material coming into a through hole when a conveyance path of the photosensitive material is formed can be prevented. When pre-washing processing is carried out prior to development processing using a developer, processing unevenness in which an overcoat layer partially remains can be prevented. An operation of mounting and removing conveyance rollers disposed in a pair is facilitated and a proper nipping force can be imparted between a conveyance roller pair. Mounting of a replenisher case filled with a replenisher is facilitated and a replenisher is kept from remaining in piping or in a replenisher case.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.