Method and apparatus for coupling a pellicle to a photomask using a non-distorting mechanism
US6911283B1 · kind B1 · utility
16Cited by
10References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 7, 2002 |
| Grant date | Jun 28, 2005 |
| Priority date | — |
| Expiry date | Nov 27, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/64
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus for coupling a pellicle to a photomask using a non-distorting mechanism are disclosed. A pellicle is coupled to a photomask with a non-distorting mechanism that is located on a pellicle frame opposite a thin film coupled to the pellicle frame. The non-distorting mechanism acts to reduce stress exerted on the photomask by the pellicle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.