Patent · US Expired

Anionic and Lewis base photopolymerization process and its use for making optical articles

US6911485B1 · kind B1 · utility

1Cited by
20References
5Claims
0Family size

Assignees

Inventors

Key dates

Filing dateApr 19, 2002
Grant dateJun 28, 2005
Priority date
Expiry dateOct 8, 2022

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08F2/50
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

The invention relates to a process for polymerising a monomer, polymerizing and/or crosslinking a oligomer, or crosslinking a polymer or copolymer, said monomer, oligomer, polymer and copolymer being selected among precursor monomers, urethane, thiourethane and episulfide oligomers, and urethane, thiourethane and episulfide polymers and copolymers, which comprises:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.