Fabricating sub-resolution structures in planar lightwave devices
US6913871B2 · kind B2 · utility
5Cited by
7References
27Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 23, 2002 |
| Grant date | Jul 5, 2005 |
| Priority date | — |
| Expiry date | Feb 3, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/001
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Optical gratings are fabricated on a scale that may be smaller than the resolution of the lithographic system used to generate the grating pattern. Parallel ridges are formed using lithographic techniques. A conformal deposition and anisotropic etch are then used to form sidewalls on the sides of the ridges. After removing the ridges, the remaining sidewalls are used as a mask to etch the substrate. Removing the sidewalls leaves the desired grating pattern, with a pitch spacing of one-half that of the original ridges.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.