Micro lens and method and apparatus for fabricating
US6914724B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 22, 2002 |
| Grant date | Jul 5, 2005 |
| Priority date | — |
| Expiry date | Jul 2, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B7/22
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Micro lenses are fabricated using processes which operate on multiple lenses at a time. In one embodiment, wafer-scale processing includes employing photolithography for defining gray-scale masks which permit relatively smooth or continuous curvatures of lens surfaces to be formed by, e.g., reactive ion etching. Processes and materials are used which achieve desired etching at a sufficiently rapid rate such as etching to a depth of about 200 micrometers in less than about 10 hours. Wafer-scale molding processes can also be used. Diffractive features can be formed on or adjacent lens surfaces to provide functions such as dispersion correction. Also, sub-wavelength scale features may be etched to provide quarter-wave plate functionality, birefringence, anti-reflective functions and the like. Structures such as mounting rings and/or crash stops can be formed integrally with the lens body, eliminating the need to glue or otherwise couple separate components.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.