Device for the plasma treatment of gases
US6916400B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 26, 2001 |
| Grant date | Jul 12, 2005 |
| Priority date | — |
| Expiry date | Jan 19, 2022 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2219/1293
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Provided is a device for the microwave-sustained plasma treatment of gases, which comprises a hollow structure forming a waveguide intended to be connected to a microwave generator, and means for making the gas to be treated flow through the said structure in a region in which the amplitude of the electric field associated with the incident wave is high. The means for making the gas flow comprise a plasma torch for producing a plasma in the gas. The torch comprises an injector made of an electrically conducting material mounted on a first large face of the said structure and extending so as to project through an orifice made in a second large face opposite the said first large face. A gap for passage of the incident waves lies around the injector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.