Rotational stage with vertical axis adjustment
US6917420B2 · kind B2 · utility
4Cited by
13References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 8, 2004 |
| Grant date | Jul 12, 2005 |
| Priority date | — |
| Expiry date | Jun 8, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A stage system is disclosed for supporting and positioning a semiconductor wafer for inspection in an optical metrology device. A chuck for supporting a wafer is mounted to the stage system. The stage system can move the chuck along two linear orthogonal axes. A rotational stage is also provided for rotating the chuck. A mechanism is provided for adjusting the vertical position of a chuck to allow for focusing of the probe beam of the metrology device. The vertical adjustment mechanism is designed so that it does impede the rotational positioning of the chuck.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.