Acrylic compounds for sub-200 nm photoresist compositions and methods for making and using same
US6919160B2 · kind B2 · utility
1Cited by
2References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 20, 2003 |
| Grant date | Jul 19, 2005 |
| Priority date | — |
| Expiry date | Apr 19, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/115
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed herein is an acrylic compound that can be polymerized by itself or with at least one other ethylenically unsaturated monomer to provide a polymer. The polymer may be used, for example, within a sub-200 nm photoresist composition. Also disclosed is a method to make the acrylic compound of the present invention from the raw material trifluoroacetone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.