Patent · US Expired

Wafer-scale manufacturing method

US6921676B2 · kind B2 · utility

4Cited by
3References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 28, 2003
Grant dateJul 26, 2005
Priority date
Expiry dateSep 12, 2023

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/68
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

The wafer-scale assembly method provides first elements arrayed on a wafer with adjacent ones of the first elements separated by a predetermined spacing. Second elements are also provided. A spacing-defining jig is provided that includes recesses corresponding in size to the second elements. Adjacent ones of the recesses are separated by a spacing equal to the predetermined spacing. The second elements are inserted into the recesses of the spacing-defining jig and are then affixed to the wafer with the second elements in alignment with corresponding ones of the first elements. Inserting the second elements in to the jig in which the recesses are separated by a spacing equal to the predetermined spacing allows a single alignment operation to provide accurate alignment between all the first elements, e.g., image sensors, arrayed on the wafer and all the second elements, e.g., lens assemblies, that are to be affixed to the first elements arrayed on the wafer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.