Low temperature metal oxide coating formation
US6921707B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 26, 2000 |
| Grant date | Jul 26, 2005 |
| Priority date | — |
| Expiry date | May 26, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/935
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for forming metal oxides, including mixed metal oxides, in a dilute vapor phase at a temperature below approximately 350 degrees Fahrenheit. The resulting novel oxides can be formed as dense films or coatings with very high strain-to-crack values, or as nanoparticles, depending primarily upon the concentration of the reactants. The novel oxides are formed by the reaction in the vapor phase of reactive metal molecules with atomic oxygen. The reactions are instantaneous at room temperature, which permits this process to be applied to the formation of metal oxides on temperature sensitive substrates. The atomic oxygen and highly reactive metal containing molecules are generated by the application of an effective amount of ultraviolet radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.